Papers - Makabe, Toshiaki

A modeling of DC magnetron plasma for sputtering: transport of sputtered copper atoms

T. Yagisawa and T. Makabe

J.Vac,Sci.Technol.A 24   908-13 2006

Research paper (scientific journal), Joint Work, Accepted

Increased O(1D) metastable density in highly Ar-diluted oxygen plasmas

T. Kitajima, T. Nakano, and T. Makabe

Appl.Phys.Lett. 88   091501(3pp) 2006

Research paper (scientific journal), Joint Work, Accepted

Optical diagnostics for plasma-surface interaction in CF4/Ar radio-frequency inductively coupled plasma during Si and SiO2 etching

Y. Miyoshi, M. Miyauchi, Y. Komukai, and T. Makabe

J.Vac.Sci.Technol.A 24   1718-24 2006

Research paper (scientific journal), Joint Work, Accepted

Oxygen atom density in rare gas diluted O2 radio frequency plasma

T. Kitajima, J. Nakashima, T. Nakano, and T. Makabe

Thin Solid Films 506-507   489-93 2006

Research paper (scientific journal), Joint Work, Accepted

Rare gas metastable atom density in diluted O2 RF plasmas

T. Kitajima, K. Takahashi, T. Nakano, and T. Makabe

IEEJ Trans. FM 126   37-42 2006

Research paper (scientific journal), Joint Work, Accepted

Modeling of radial uniformity at a wafer interface in a 2f-CCP for SiO2 etching

T. Yagisawa, T. Shimada, and T. Makabe

J.Vac.Sci.Technol.B 23   2212-17 2005

Research paper (scientific journal), Joint Work, Accepted

Electron transport coefficients in O2 magnetron discharges

R. D. White, K. E. Ness, R. E. Robson, and T. Makabe

J.Phys.D 38   997-1004 2005

Research paper (scientific journal), Joint Work, Accepted

Transport coefficients for electrons in argon in crossed electric and magnetic rf fields

Z. M. Raspopovic, D. Dujko, T. Makabe, and Z. Lj. Petrovic

Plasma Sources Sci. Technol. 14   293-300 2005

Research paper (scientific journal), Joint Work, Accepted

Three dimensional singular images of low pressure hydrogen-ICP in E-mode

Y. Miyoshi, M. Miyauchi, A. Oguni, and T. Makabe

IEEE Trans. on Plasma Sci. 33   362-3 2005

Research paper (scientific journal), Joint Work, Accepted

Time-resolved measurement of charging on hole bottoms of SiO2 wafer exposed to plasma etching in a pulsed two- frequency capacitively coupled plasma

T. Ohmori, T. K. Goto, T. Kitajima, and T. Makabe

Jpn.J.Appl.Phys.(Exp. Lett.) 44   L1105-08 2005

Research paper (scientific journal), Joint Work, Accepted

Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

T. Sato and T. Makabe

J.Appl.Phys. 98   113304(3pp) 2005

Research paper (scientific journal), Joint Work, Accepted

Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

S. Kuroiwa, T. Mine, T. Yagisawa, and T. Makabe

J.Vac.Sci.Technol.B 23   2218-21 2005

Research paper (scientific journal), Joint Work, Accepted

Modeling of N2-H2 capacitively coupled plasma for low-k material etching

C-H. Shon and T. Makabe

IEEE Trans. on Plasma Sci. 32   390-8 2004.04

Research paper (scientific journal), Joint Work, Accepted

Prediction of a radial variation of plasma structure and ion distributions in the wafer interface in 2-frequency capacitively coupled plasma

T. Yagisaw, K. Maeshige, T. Shimada, and T. Makabe

IEEE Trans. on Plasma Sci. 32   90-100 2004.02

Research paper (scientific journal), Joint Work, Accepted

Influence of driving frequency on oxygen atom density in O2 radio frequency capacitively coupled plasma

T. Kitajima, K. Noro, T. Nakano, and T. Makabe

J.Phys.D 37   2670-6 2004

Research paper (scientific journal), Joint Work, Accepted

Negative charge injection to wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching: diagnostics for an interface by emission selected-computerized tomography

T. Ohmori, T. Goto, and T. Makabe

J.Phys.D 37   2223-31 2004

Research paper (scientific journal), Joint Work, Accepted

Funtional separation in two frequency operation of an Inductively Coupled Plasma

T. Denda, Y. Miyoshi, T. Goto, K. Komukai, Z. Lj. Petrovic, and T. Makabe

J.Appl.Phys. 95   870-6 2004

Research paper (scientific journal), Joint Work, Accepted

Comparison of direct numerical procedure and Monte Carlo technique to determine the charging effects in submicron structures

Z. Lj. Petrovic, S. Sakadzic, N. Spasojevic, J. Matsui, and T. Makabe

Materials Sci. Forum 453-454   9-14 2004

Research paper (scientific journal), Joint Work, Accepted

Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar

T. Ohmori, T. Goto, T. Kitajima, and T. Makabe

Appl.Phys.Lett. 83   4637-9 2003.11

Research paper (scientific journal), Joint Work, Accepted

Negative mobilities of electron in radio frequency fields

S. Dujko, Z. M. Raspopovic, Z. Lj. Petrovic, and T. Makabe

IEEE Trans. on Plasma Sci. 31   711-6 2003.08

Research paper (scientific journal), Joint Work, Accepted